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Karl Suss MJB3 Mask Aligner
Karl Suss MJB3 Mask Aligner
 


Product Code: 10141
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Description
 
The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter.

Microscope:    M400 Normalfield with revolving objective turret and trinocular microscope head

Microscope Objectives:    Leitz NPL 5X, 10X, and 20X objectives

Microscope Oculars:    10X eyepieces

Lamphouse:    350W lamphouse

Lamp:    350W High Pressure Mercury (Hg) lamp is currently installed

Exposure Optics:    UV400

Optical Sensor:    CH1: 365nm, CH2: 405nm

Timer:    Digital

CIC Power Supply:    CIC 1000 constant intensity controller

NOTE:    THIS MJB 3 CAN ALSO BE ORDERED FOR THE FOLLOWING CONFIGURATIONS:
DUV APPLICATIONS (254nm) IR ALIGNMENT.  PLEASE CONTACT US FOR DETAILS AND PRICING

Tooling:    Includes one (1) set of standard mask holder and matching wafer alignment chuck to customer''s desired wafer size

Vib/Iso Table:    Sold separately; subject to availability at time of order

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